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New Paper published in Angewandte Chemie

Chemical Vapor Deposition of Phase-Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors

Homoleptic uranium(IV) amidate complexes have been synthesized and applied as single-source molecular precursors for chemical vapor deposition of UO2 thin films. These precursors decompose by alkene elimination to give highly crystalline, phasepure UO2 films with an unusual branched heterostructure.

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