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Gasphasensynthese von nanostrukturierten Materialien

Gas phase processing methods such as chemical vapor deposition (CVD) or atomic layer deposition (ALD) allow the fabrication of well defined nanostructured materials under reduced pressure. The bottleneck of the application of these technologies is the availability of appropriate molecular precursors. The gas phase deposition systems available at the research group allow the investigation of new precursor systems under different process conditions and parameters.