zum Inhalt springen

Plasma-assisted Chemical Vapour Deposition (PECVD)

Three modified commercial PECVD-systems (Plasma Electronic) are operated in the research group for testing new molecular precursors for coating applications:

  1. Room Temperature PECVD
  2. Elevated Temperature PECVD (20 - 700 °C)
  3. Combined PECVD/PVD system with large chamber

These systems allow a homogeneous deposition of either metal oxides (e.g. SiO2, TiO2, FeOx), carbides, nitrides or composites on metal, ceramic, glass or polymer substrates.